nX-FM1
Wafer Shape Measurement Equipment
The wafer warpage measurement system performs high-speed scanning to measure the entire shape of a 12-inch wafer in just 5 seconds. It is a process-reference equipment that provides full-surface shape data and 3D images at a high throughput level for process control in Advanced Wafer-Level Packaging (AWLP).
This system is capable of measuring wafers with significant warpage, which was challenging with conventional methods. It supports shape measurement for various types of wafers, including bare wafers, patterned wafers, bonded wafers, and glass wafers. The resulting comprehensive wafer data, along with high-resolution 3D images and analysis, will serve as crucial process data to enhance yield.
Application
Wafer Warpage 3D Image
Wafer Warpage 3D Image
Wafer Warpage 2D Image
Wafer Wheel Mark 2D Image
Specifications
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Measuring model Measuring technology Test content Measuring data
Large-area measurement with WSI interferometers
FOV extensive application
Micro Bump Height
Monolayer membrane thickness measurement
PCB fine pattern
Processed surface roughness measurement
Sensor step-difference measurement
Free-Form Metrology
Divided inspection possible according to product curve angels
Inspection of lens and glass, and measurement of shapes
Inspection of OLED surfaces, and measurement of shapes
Inspection of wafer surfaces, and measurement of shapes
Real-time measurement of transparent and semitransparent product thickness
Applicable to multi-channels
Measurement of wafer(silicone, sapphire) thickness
Measurement of glass and film thickness